Description
DESCRIPTION A non-crystallizing silica (SiO2) suspension stabilized at an alkaline pH value of 9.8. The combination of very fine abrasive particles in a chemically aggressive liquid provides a Chemical-Mechanical Polishing (CMP) action. Ideal for final polishing to obtain a deformation-free surface. Obtain excellent results on IC-cross sections, ceramics, minerals, hard steels and ductile non-ferrous materials. Recommended as final polishing for EBSD samples. SDS (140KB PDF) Supplied in 32 oz bottle (950ml) with a 40% particle concentration in water, pH range 9.7-9.9. Colloidal Silica Suspension, 0.06µm, 32 oz. (950ml)
CategoryVape, Vape
BrandNot provided
SKUPRD-707B317E38CD
Global identifierNot provided
Identifier typeNot provided
Manufacturer part numberNot provided
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